The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Oct. 06, 2005
Karl Cazzini, Orchard Park, NY (US);
Roland E. Flick, Elma, NY (US);
Ronald S. Snyder, Orchard Park, NY (US);
Karl Cazzini, Orchard Park, NY (US);
Roland E. Flick, Elma, NY (US);
Ronald S. Snyder, Orchard Park, NY (US);
Gaymar Industries, Inc., Orchard Park, NY (US);
Abstract
The present invention is directed to a patient transfer system. The patient transfer system is positioned on a support area of a first underlying surface's top surface. The support area (a) receives a patient and (b) is defined by a head end, a foot end, a first side and a second side. The patient transfer system has a base sheet, a transfer sheet a support sheet, a first attachment mechanism, and a second attachment mechanism. The base sheet covers the support area and has (a) a pivot line positioned near or at the first side and (b) a transition line positioned near or at the second side. The transfer sheet has (a) a proximal end that connects to the base sheet at pivot line and (b) a distal end that extends to the transition line. The support sheet has (a) a proximal end that connects to the transfer sheet above the transition line and (b) a distal end that extends at least to the pivot line. The first attachment mechanism connects the support sheet's distal end to the base sheet or the transfer sheet's proximal end. The second attachment mechanism connects the transport sheet's distal end to the base sheet.