The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Sep. 12, 2003
Hiroshi Morohoshi, Utsunomiya, JP;
Hiroshi Morohoshi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure method for projecting, through a projection optical system, a predetermined pattern formed on a mask onto an object to be exposed. The exposure method includes the steps of dividing an effective light source area for illuminating the mask into plural point light sources, calculating a Zernike sensitivity coefficient that represents a sensitivity of a change of image quality of the predetermined pattern to a change of a Zernike coefficient, when wave front aberration in the projection optical system is developed into a Zernike polynomial for all divided point light sources, determining an effective light source distribution based on a combination of Zernike sensitivity coefficient of all divided point light sources, and forming the effective light source distribution by intensity of each point light source.