The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Jan. 29, 2003
Takashi Gouke, Higashine, JP;
Takashi Gouke, Higashine, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A polycrystalline structure film is formed on the surface of a substrate in a magnetic recording medium. The second magnetic layer has a saturation magnetic flux density Bs larger than that of the first magnetic layer in the polycrystalline structure film, so that the magnetic layer for recordation ensures a larger residual magnetization Br, as compared with the case where the first magnetic layer solely forms a magnetic layer for recordation. A sufficient magnitude of product tBr of thickness t and residual magnetization Br can be obtained even if the thickness of the overall magnetic layer for recordation is reduced. A sufficient magnitude of magnetic outputs can be ensured. A reduced thickness of the magnetic layer serves to minimize the magnetic crystal grains in the first and second magnetic layers. A higher resolution of recordation and reproduction can be obtained.