The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Oct. 17, 2003
Tjaart Andries Du Plessis, Pretoria, ZA;
Song Cheng, East Windsor, NJ (US);
Horst Seute, Pretoria, ZA;
Tjaart Andries Du Plessis, Pretoria, ZA;
Song Cheng, East Windsor, NJ (US);
Horst Seute, Pretoria, ZA;
Ion Beam Applications, S.A., Louvain-la-Neuve, BE;
Gammatron Pty LTD, Pretoria, ZA;
Abstract
The invention relates to ethylene polymers that are modified by ionizing radiation, prior to article formation, at a temperature less than the crystalline melt temperature and preferably under ambient atmosphere, as well as articles made from said polymers. The irradiated ethylene polymers exhibit enhanced melt strength, tensile strength, impact resistance, tear strength, adhesion to polar substances and thermal stability, decreased elongation, and lower melt flow index, but are easily processed and converted into and onto articles by conventional technologies including injection molding, extrusion, film and bottle blowing and powder coating.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile