The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
May. 23, 2005
Chao-ming Koh, Shuang-His Tsun, TW;
Jia-ching Doong, Kaohsiung, TW;
Hsien-tzu Chang, Judung Jen, TW;
Hao-cheng Hung, Jubei, TW;
Chao-Ming Koh, Shuang-His Tsun, TW;
Jia-Ching Doong, Kaohsiung, TW;
Hsien-Tzu Chang, Judung Jen, TW;
Hao-Cheng Hung, Jubei, TW;
Vanguard International Semiconductor Corporation, Hsinchu, TW;
Abstract
A method for fabricating Fiber Bragg Grating elements and planar light circuits made thereof. A mask having a predetermined pattern and a wafer are provided, wherein a light-guiding channel filled with light-guiding substance is formed on the wafer. A photoresist layer is then formed to cover the wafer. Magnification of a photolithography apparatus is adjusted to a first Mag., followed by transferring the pattern on the mask to the photoresist layer to form a first pattern. Light-guiding substance not covered by the photoresist layer is then removed so that the first pattern is transferred to the light-guiding channel. The light-guiding channel then forms a Fiber Bragg Grating element.