The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2006

Filed:

May. 20, 2002
Applicants:

Kyunghee Lee, Daejeon, KR;

Yongwha Chung, Daejeon, KR;

Chee Hang Park, Daejeon, KR;

Hyeran Byun, Seoul, KR;

Inventors:

Kyunghee Lee, Daejeon, KR;

Yongwha Chung, Daejeon, KR;

Chee Hang Park, Daejeon, KR;

Hyeran Byun, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for performing face registration and authentication using face information, and a method thereof. A set of readily distinguishable features for each user is selected at a registration step and only the set of features selected at the registration step is used at a face authentication step, whereby memory use according to unnecessary information and amount of data calculation for face authentication can be reduced. Thus, the present system has an advantage in that identity authentication through face authentication can be performed even under restricted environments of a USB token or smart card with limited resources. The present system further has advantages in that authentication performance is improved, as readily distinguishable feature information is used, and the time for face authentication is reduced, as face authentication is performed using the SVM built by using the optimal set of readily distinguishable features at a training step.


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