The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Sep. 29, 2003
Xiaoping Qian, Clifton Park, NY (US);
Kevin George Harding, Niskayuna, NY (US);
Xiaoping Qian, Clifton Park, NY (US);
Kevin George Harding, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
The present disclosure provides for an optical metrology system for scanning an object () having a shiny surface. The optical metrology system includes at least one light source () configured and adapted to emit a structured light pattern (L) against the surface of the object, at least one first polarizer () disposed between the light source and the object such that the light pattern passes therethrough, the first polarizer being configured and adapted to vary at least one of the plane of polarization and the polarization angle of the light pattern, at least one camera () configured and adapted to take images of the object, and at least one second polarizer disposed between the camera and the object, the second polarizer having a fixed orientation.