The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2006

Filed:

Oct. 02, 2001
Applicants:

Wee K Leow, Singapore, SG;

Zhiyong Huang, Singapore, SG;

Luping Zhou, Singapore, SG;

Indriyati Atmosukarto, Singapore, SG;

Inventors:

Wee K Leow, Singapore, SG;

Zhiyong Huang, Singapore, SG;

Luping Zhou, Singapore, SG;

Indriyati Atmosukarto, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of polygonizing an object calculates indicators that points within a set (Q) of points within three space representing the object likely lie near a surface discontinuity of the object. A global mesh is formed around a point that likely does not lie near a surface discontinuity (i.e. a reliable point). Local meshes are formed about reliable points on the frontier of this global mesh. Each local mesh is combined with the global mesh, thereby adding to the global mesh and advancing the frontier. Once a local mesh has been formed about each reliable point on the frontier and added to the global mesh, a local mesh may be formed about a point on the frontier that is more likely to lie near a surface discontinuity. The formation of local meshes can be repeated until no frontiers are left, or until all points have been added to the global mesh.


Find Patent Forward Citations

Loading…