The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
May. 16, 2003
Applicants:
Robert P. Bourdelais, Pittsford, NY (US);
Cheryl J. Kaminsky, Webster, NY (US);
Wen-li A. Chen, Rochester, NY (US);
Yawcheng Lo, Rochester, NY (US);
Inventors:
Robert P. Bourdelais, Pittsford, NY (US);
Cheryl J. Kaminsky, Webster, NY (US);
Wen-Li A. Chen, Rochester, NY (US);
Yawcheng Lo, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); B42D 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a validation device comprising at least one specular reflective layer, indicia on said reflective layer, a polymer protective layer overlaying said indicia, and a polymer protective layer on the side of the reflective layer opposite to said indicia wherein said indicia are formed by thermal dye transfer.