The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2006

Filed:

Feb. 25, 2003
Applicants:

Baomin Xu, Cupertino, CA (US);

Steven A. Buhler, Sunnyvale, CA (US);

Michael C. Weisberg, Woodside, CA (US);

William S. Wong, San Carlos, CA (US);

Scott E. Solberg, Mountain View, CA (US);

Karl A. Littau, Palo Alto, CA (US);

John S. Fitch, Los Altos, CA (US);

Scott A. Elrod, La Honda, CA (US);

Inventors:

Baomin Xu, Cupertino, CA (US);

Steven A. Buhler, Sunnyvale, CA (US);

Michael C. Weisberg, Woodside, CA (US);

William S. Wong, San Carlos, CA (US);

Scott E. Solberg, Mountain View, CA (US);

Karl A. Littau, Palo Alto, CA (US);

John S. Fitch, Los Altos, CA (US);

Scott A. Elrod, La Honda, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of producing at least one piezoelectric element includes depositing a piezoelectric ceramic material onto a surface of a first substrate to form at least one piezoelectric element structure. Then an electrode is deposited on a surface of the at least one piezoelectric element structure. Next, the at least one piezoelectric element structure is bonded to a second substrate, the second substrate being conductive or having a conductive layer. The first substrate is then removed from the at least one piezoelectric element structure and a second side electrode is deposited on a second surface of the at least one piezoelectric element structure. A poling operation is performed to provide the at least one piezoelectric element structure with piezoelectric characteristics.


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