The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2006

Filed:

Nov. 27, 2002
Applicants:

Thomas Krumrey, Ratingen, DE;

Kurt Schalapski, Oberhausen, DE;

Robert Rapier, Ponca City, OK (US);

John Steinbach, Bay City, TX (US);

Bak Shah, Bay City, TX (US);

Mark Hewlett, Bay City, TX (US);

Inventors:

Thomas Krumrey, Ratingen, DE;

Kurt Schalapski, Oberhausen, DE;

Robert Rapier, Ponca City, OK (US);

John Steinbach, Bay City, TX (US);

Bak Shah, Bay City, TX (US);

Mark Hewlett, Bay City, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 45/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a hydroformylation method, whereby the homogeneous liquid reactor discharge is first supplied to a gas/liquid separator and then run through an extraction column with a counter-current of synthesis gas and finally fed to an evaporator. The invention is characterised in that the homogeneous liquid mass flow is supplied to the upper section of the extraction column at a temperature above 90° C.


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