The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2006
Filed:
Feb. 17, 2004
Kikuo Kaise, Kanagawa, JP;
Kazuhiro Shinoda, Miyagi, JP;
Moriaki Abe, Miyagi, JP;
Shoji Hasegawa, Miyagi, JP;
Kikuo Kaise, Kanagawa, JP;
Kazuhiro Shinoda, Miyagi, JP;
Moriaki Abe, Miyagi, JP;
Shoji Hasegawa, Miyagi, JP;
Sony Corporation, Tokyo, JP;
Abstract
Disclosed herein is a method for manufacturing a microlens substrate which is excellent in chemical resistance and light fastness to intense light irradiation, and is capable of forming a microlens substrate of a high accuracy of form. The method includes the steps of: forming a lens-shaped curve at a surface side of a transparent substrate; forming an inorganic material film on the transparent substrate so as to bury the curve therewith; and planarizing the surface of the inorganic material film to provide a microlens where the curve is buried with the inorganic material film.