The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2006

Filed:

Aug. 07, 2001
Applicants:

Mindaugas F. Dautartas, Blacksburg, VA (US);

Dan A. Steinberg, Blacksburg, VA (US);

Jasean Rasnake, Blacksburg, VA (US);

Inventors:

Mindaugas F. Dautartas, Blacksburg, VA (US);

Dan A. Steinberg, Blacksburg, VA (US);

Jasean Rasnake, Blacksburg, VA (US);

Assignee:

Shipley Company, L.L.C., Marlborough, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23Q 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for passively aligning first and second substrates having micro-components disposed thereon when the substrates do not include patterned surfaces which face each other. The apparatus includes a first depression which cooperates with an alignment sphere to mechanically engage a corresponding depression disposed on the front surface of the first substrate and a second depression which cooperates with a second alignment sphere to mechanically engage a corresponding depression disposed on the front surface of the second substrate. The first and second depression of the alignment apparatus and the alignment spheres cooperate to passively align micro-components disposed on each of the substrates.


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