The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Dec. 15, 2003
Srijit Kamath, Gainesville, FL (US);
Sartaj Sahni, Gainesville, FL (US);
Jantinder Palta, Gainesville, FL (US);
Sanjay Ranka, Gainesville, FL (US);
Jonathan G. LI, Gainesville, FL (US);
Srijit Kamath, Gainesville, FL (US);
Sartaj Sahni, Gainesville, FL (US);
Jantinder Palta, Gainesville, FL (US);
Sanjay Ranka, Gainesville, FL (US);
Jonathan G. Li, Gainesville, FL (US);
The University of Florida Research Foundation, Inc., Gainesville, FL (US);
Abstract
A method of delivering radiation treatment using multi-leaf collimation includes the step of providing a radiation fluence map which includes an intensity profile. The fluence map is converted into a preliminary leaf sequence, wherein the preliminary leaf sequence minimizes machine on-time and is generated without leaf movement constraints. The leaf movement constraint is imposed on the preliminary leaf sequence. At least one constraint elimination algorithm is then applied, the algorithm adjusting the preliminary leaf sequence to minimize violations of the constraint while providing the desired fluence map and minimized radiation on-time. The method can be applied to SMLC and DLMC systems, and can include adjustment for the tongue-and-groove effect.