The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Sep. 25, 2002
Yehiel Gotkis, Fremont, CA (US);
Rodney Kistler, Los Gatos, CA (US);
Aleksander Owczarz, San Jose, CA (US);
David Hemker, San Jose, CA (US);
Nicolas J. Bright, San Jose, CA (US);
Yehiel Gotkis, Fremont, CA (US);
Rodney Kistler, Los Gatos, CA (US);
Aleksander Owczarz, San Jose, CA (US);
David Hemker, San Jose, CA (US);
Nicolas J. Bright, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method and an apparatus for enhancement of the for measuring resistance-based features of a substrate is provided. The apparatus includes a sensor configured to detect a signal produced by a eddy current generated electromagnetic field. The magnetic field enhancing source is positioned to the alternative side of the object under measurement relative to the sensor to enable the sensitivity enhancing action. The sensitivity enhancing source increases the intensity of the eddy current generated in the object under measurement, and as a result the sensitivity of the sensor. A system enabled to determine a thickness of a layer and a method for determining a resistance-based feature characteristic are also provided.