The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Feb. 13, 2003
Qing Ji, Berkeley, CA (US);
Keith Standiford, Carmel, CA (US);
Tsu-jae King, Fremont, CA (US);
Ka-ngo Leung, Hercules, CA (US);
Qing Ji, Berkeley, CA (US);
Keith Standiford, Carmel, CA (US);
Tsu-Jae King, Fremont, CA (US);
Ka-Ngo Leung, Hercules, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures. The aperture(s) in the first electrode (or the second electrode or both) have a counterbore on the downstream side (i.e. away from the plasma ion source or facing the second electrode). The counterbored extraction system reduces aberrations and improves focusing. The invention also includes an ion source with the counterbored extraction system, and a method of improving focusing in an extraction system by providing a counterbore.