The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
May. 14, 2004
Takeshi Soeda, Kawasaki, JP;
Takeshi Soeda, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A lattice strain measuring method including the steps of: using a scanning transmission electron microscopeto apply convergent electron beamsto a sampleand obtain a convergent-beam electron diffraction imageof the sample; computing a lattice strain magnitude of the sample, based on the obtained convergent-beam electron diffraction image; and displaying the computed lattice strain magnitude, associated with an electron microscope image of the sample. A scanning transmission electron microscopeis used, whereby electron beamsare caused to scan to thereby suitably set an incidence position. Accordingly, the incidence position of the electron beams can be displaced at a nanometer-order pitch accurately in a short period of time. The use of a scanning transmission electron microscoperequires no image forming lens below the sample, and the convergent-beam electron diffraction image is free from the distortion due to the influence of an image forming lens. Thus, a distribution of lattice strains in an electronic device having, e.g., a micronized structure can be displayed in an image with high resolving power and with high accuracy and furthermore in a short period of time.