The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Mar. 10, 2003
Kazuyoshi Arai, Yokohama, JP;
Tsutomu Takahata, Yokohama, JP;
Shinkichi Hashimoto, Sagamihara, JP;
Hideaki Kiriya, Atsugi, JP;
Yoshinori Harada, Sagamihara, JP;
Kazuyoshi Arai, Yokohama, JP;
Tsutomu Takahata, Yokohama, JP;
Shinkichi Hashimoto, Sagamihara, JP;
Hideaki Kiriya, Atsugi, JP;
Yoshinori Harada, Sagamihara, JP;
Tosoh Corporation, Yamaguchi, JP;
Tosoh Quartz Corporation, Yamagata, JP;
Tosoh SGM Corporation, Yamaguchi, JP;
Abstract
Highly durable silica glass comprising silica having incorporated therein aluminum and at least one element (M) selected from group 2A elements, group 3A elements and group 4A elements of the periodic table. Preferably, the sum of aluminum and element (M) is at least 30 atomic % based on the amount of total metal elements in the silica glass, and the atomic ratio of aluminum to element (M) is in the range of 0.05 to 20. The silica glass has a high purity and exhibits enhanced durability while good processability and machinability, and reduced dusting property are kept, and the glass is suitable for members of a semiconductor production apparatus or liquid crystal display production apparatus using a halogenated gas and/or its plasma.