The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Jan. 20, 2004
Yasuyuki Koyagi, Kyoto, JP;
Hiroko Shimozuma, Kyoto, JP;
Yasuyuki Koyagi, Kyoto, JP;
Hiroko Shimozuma, Kyoto, JP;
Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;
Abstract
A photo-fabrication apparatus comprises a stage for holding a photosensitive member which is a substrate coated with a photosensitive material, a head part for emitting a spatially-modulated light beam to said photosensitive member and a computer. The head part has a DMD having a plurality of micromirrors arranged in a two-dimensional array, and a light beam from a light source is reflected on only some of the group of micromirrors in the DMD which have a predetermined tilt angle and led onto the photosensitive member. In the photo-fabrication apparatus, the tilt angle of each micromirror in the DMD is controlled by the computer. This can control the quantity of irradiation light for an irradiation region on the photosensitive member corresponding to each micromirror, to perform an exposure in accordance with a three-dimensional shape of a desired object for a short time. The exposed photosensitive member is developed by another apparatus.