The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Jul. 29, 2003
Fumitaro Masaki, Tochigi, JP;
Akira Miyake, Tochigi, JP;
Fumitaro Masaki, Tochigi, JP;
Akira Miyake, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for adjusting an optical system that has a multilayer mirror that includes a multilayer film includes the steps of measuring wave front aberration of the optical system, determining a condition to remove part of the multilayer film in the multilayer mirror so that the wave front aberration measured in the measuring step may reduce, and removing the part of the multilayer film in the multilayer mirror based on the condition determined by the determining step.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile