The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Jun. 05, 2003
Lennart Olsson, Malmö, SE;
Lennart Olsson, Malmö, SE;
Obducat AB, Malmo, SE;
Abstract
A method and a device for forming at least a first pattern on a substrate (), which is coated with a layer () on at least a first planar surface, are described. According to the method, a first pressing means () is arranged with a first structure () that defines the pattern, and the substrate () is arranged so that the first pressing means () is separated from the substrate () and so that the first pressing means () and the substrate () are unable to move transversely of the common center line () but are able to move freely in a direction along the center line (). Subsequently, the first pressing means () is contacted with the substrate () while maintaining the common center line, and a pressure is applied to the substrate () and the first pressing means () to form said at least one pattern in the layer ()