The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2006
Filed:
Nov. 21, 2003
Applicants:
Sung Koo Lee, Seoul, KR;
Jae Chang Jung, Seoul, KR;
Inventors:
Sung Koo Lee, Seoul, KR;
Jae Chang Jung, Seoul, KR;
Assignee:
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); C08F 216/38 (2006.01); C08F 220/56 (2006.01);
U.S. Cl.
CPC ...
Abstract
Photoresist polymers and photoresist compositions containing the same are disclosed. A negative photoresist composition containing a photoresist polymer comprising a repeating unit represented by Formula 4 prevents collapse of patterns when photoresist patterns of less than 50 nm are formed. Accordingly, the disclosed negative photoresist composition is very effective for a photolithography process using EUV (Extreme Ultraviolet, 13 nm) light source.
Lee, Sung. (2006). Photoresist polymer and photoresist composition including the same (U.S. Patent No. 7081325). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7081325
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile