The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2006
Filed:
Nov. 05, 2003
Benjamin J. Eggleton, Summit, NJ (US);
Misha Sumetsky, Bridgewater, NJ (US);
Paul S. Westbrook, Chatham, NJ (US);
Benjamin J. Eggleton, Summit, NJ (US);
Misha Sumetsky, Bridgewater, NJ (US);
Paul S. Westbrook, Chatham, NJ (US);
Fitel USA Corp, Norcross, GA (US);
Abstract
In accordance with the invention, the fabrication of a grating phase mask is improved by providing a multiple-scan exposure which can provide an accumulated exposure that is effectively phase modulated or modulated rapidly in amplitude. Applicants have determined that exposure scans can be chosen so that each is modulated in amplitude and without modulation in phase, but the accumulated exposure of the multiple scans is modulated in phase and/or modulated in amplitude. The improved method can be used to make phase masks for fabrication of sophisticated fiber gratings such as superstructure gratings.