The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2006
Filed:
Apr. 13, 2004
Applicants:
Katsuhiko Tsuno, Yokohama, JP;
Shoko Suyama, Minato-ku, JP;
Tsuneji Kameda, Minato-ku, JP;
Yoshiyasu Ito, Minato-ku, JP;
Inventors:
Katsuhiko Tsuno, Yokohama, JP;
Shoko Suyama, Minato-ku, JP;
Tsuneji Kameda, Minato-ku, JP;
Yoshiyasu Ito, Minato-ku, JP;
Assignee:
NEC Toshiba Space Systems, Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G02B 7/182 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention adopts a particle dispersed silicon material, comprising silicon carbide as dispersion particles, as a mirror substrate, subjects the mirror substrate to mirror finish polishing to form a mirror body, forms a reflecting film on the mirror body to form a mirror, and uses the mirror to form a large aperture optical system.