The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2006

Filed:

Jan. 30, 2003
Applicants:

Mitsuhiko Yoshimura, Tokyo, JP;

Norifumi Nishikawa, Machida, JP;

Hitoshi Ashida, Kawasaki, JP;

Inventors:

Mitsuhiko Yoshimura, Tokyo, JP;

Norifumi Nishikawa, Machida, JP;

Hitoshi Ashida, Kawasaki, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Upon modifying a database system, a modification range is managed on the basis of a pattern name, a variable name associated therewith, an influence range detection start destination based on the variable name, and an influence range detection result as modification pattern information. And a variable value is registered according to a pattern selected based on the modification pattern information, a modification object on a plurality of middleware bases is detected as influence range information on the basis of the variable value entered in association with a modification pattern, and a schema definition of a database and a group of commands for data transformation are modified in accordance with the modification contents using the influence range information.


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