The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2006

Filed:

Apr. 22, 2003
Applicants:

Jack Hou, Fremont, CA (US);

Scott C-j Tseng, San Jose, CA (US);

Zarng-arh George Wu, San Jose, CA (US);

Rong-chang Liang, Cupertino, CA (US);

Inventors:

Jack Hou, Fremont, CA (US);

Scott C-J Tseng, San Jose, CA (US);

Zarng-Arh George Wu, San Jose, CA (US);

Rong-Chang Liang, Cupertino, CA (US);

Assignee:

SiPix Imaging, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G09G 3/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to novel patterned embossing and patterned filling methods. Both methods are simple, reliable and cost effective ways for manufacturing the segment of signage electrophoretic displays. The displays prepared by the present invention requires only one patterned electrode layer. The undesired visible line traces are eliminated and the manufacture of the present displays does not involve the costly precision registration step used in the previously known assembly processes dealing with two patterned electrodes. Moreover, the electrophoretic fluid is present only in the patterned and switchable area of the display. This not only significantly reduces the material cost, but also improves the overall display quality by reducing defects and non-uniformity.


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