The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Oct. 31, 2003
Manolito M. Catalasan, Mission Viejo, CA (US);
Vafa J. Rakshani, Newport Coast, CA (US);
Edmund H. Spittles, Chippenham, GB;
Tim Sippel, Portland, OR (US);
Richard Unda, Fullerton, CA (US);
Manolito M. Catalasan, Mission Viejo, CA (US);
Vafa J. Rakshani, Newport Coast, CA (US);
Edmund H. Spittles, Chippenham, GB;
Tim Sippel, Portland, OR (US);
Richard Unda, Fullerton, CA (US);
Broadcom Corporation, Irvine, CA (US);
Abstract
A modifiable circuit for coupling at least two adjacent logic blocks in an integrated circuit chip is disclosed. The chip includes a plurality of metal layers and first and second power supply potentials. The circuit comprises a first and second metal interconnect structures, and an interconnect. The first metal interconnect structure traverses the plurality of metal layers using a first plurality of vias, wherein the first metal interconnect structure is located at a boundary of the at least two adjacent logic blocks. The second metal interconnect structure traverses the plurality of metal layers using a second plurality of vias, wherein the second metal interconnect structure is located at the boundary of the at least two adjacent logic blocks. The interconnect is formed between the at least two adjacent logic blocks by at least one of the first and second metal interconnect structures, wherein a state of the interconnect is programmable by altering any one of the plurality of metal layers or any one of a plurality of via layers.