The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Feb. 25, 2004
Renée C. Nesnidal, Oregon, WI (US);
George Skupniewicz, Madison, WI (US);
N. Simon Nunn, Verona, WI (US);
Renée C. Nesnidal, Oregon, WI (US);
George Skupniewicz, Madison, WI (US);
N. Simon Nunn, Verona, WI (US);
Thermo Electron Scientific Instruments Corporation, Madison, WI (US);
Abstract
Mirror elements are selectively interposable in the beam paths in a dual aperture microspectrometer system to selectively bypass the aperture element in transmission or reflection modes to increase optical throughput and field of view. The system may be operated in a dual aperture transmission mode or reflection mode and in modes in which the aperture is bypassed before or after the infrared beam reaches the sample. The system may be operated to bypass the aperture both before and after the sample, which may be utilized with an array detector having multiple detector elements in which an image of the sample is formed on the array detector.