The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Jan. 14, 2004
Kazuya Uenishi, Shizuoka-ken, JP;
Kazuyuki Kitada, Shizuoka-ken, JP;
Kazuya Uenishi, Shizuoka-ken, JP;
Kazuyuki Kitada, Shizuoka-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The present invention provides is a thin film analyzing method which can be applied to various fields, and which makes it possible to detect and analyze in a simple manner, with high precision, a distribution of a specific component in a thin film formed on a support. The method for analyzing a constituent of a thin film comprises a cutting step of cutting the thin film obliquely, and an analyzing step of analyzing a specific component in the cut section of the thin film. In this cutting step, the thin film is preferably cut with a microtome to which a cutting edge made of glass is fitted knife made of glass. The analysis of the distribution of the specific component in the cut section is suitably analyzed by TOF-SIMS or μ-ESCA. The method is particularly useful for analyzing an image recording layer of a planographic printing plate precursor which comprises a water-insoluble and alkali-soluble resin, an infrared ray absorber, and a colorant.