The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Jun. 06, 2002
Jay K. Bass, Mountain View, CA (US);
Maryam Mobed-miremadi, Sunnyvale, CA (US);
Michelle M. Maranowski, San Jose, CA (US);
Roy H. Kanemoto, Palo Alto, CA (US);
Bill J. Peck, Mountain View, CA (US);
Eric M. Leproust, Campbell, CA (US);
Michael P. Caren, Palo Alto, CA (US);
Jay K. Bass, Mountain View, CA (US);
Maryam Mobed-Miremadi, Sunnyvale, CA (US);
Michelle M. Maranowski, San Jose, CA (US);
Roy H. Kanemoto, Palo Alto, CA (US);
Bill J. Peck, Mountain View, CA (US);
Eric M. Leproust, Campbell, CA (US);
Michael P. Caren, Palo Alto, CA (US);
Agilent Technologies, Inc., Santa Clara, CA (US);
Abstract
Methods are disclosed for synthesizing a plurality of compounds on the surface of supports. The synthesis comprises a series of cycles of steps in which reagents for conducting the synthesis are deposited on the surface of the support to form the chemical compounds. At least one physical parameter of the deposition varies between cycles The method comprises conducting the synthesis in at least two sets of cycles, arbitrarily designated as a first set and a second set. Each cycle comprises at least one step of depositing reagents on a surface by means of droplet dispensing elements that traverse the surface of the support. At least one, and desirably all, of the following deposition parameters are employed as indicated: The number of times of repetition for a step of depositing reagents in at least one cycle of the second set is less than the number of times of repetition for a corresponding step in at least one cycle of the first set. The rate of deposition in at least one cycle of the second set is slower than or equal to the rate of deposition in at least one cycle of the first set. The rate of traversal of the dispensing elements over the surface of the support in at least one cycle of the second set is greater than such rate of traversal in at least one cycle of the first set.