The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Jul. 28, 2003
Masaki Hashimoto, Yamatokoriyama, JP;
Kazushige Morita, Ikoma-gun, JP;
Mikio Kakui, Ikoma-gun, JP;
Yuji Tanaka, Yao, JP;
Masayuki Sakamoto, Nabari, JP;
Masaki Hashimoto, Yamatokoriyama, JP;
Kazushige Morita, Ikoma-gun, JP;
Mikio Kakui, Ikoma-gun, JP;
Yuji Tanaka, Yao, JP;
Masayuki Sakamoto, Nabari, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
The object of the invention is to prevent interference fringes of images and allow precise measurement of the thickness of a layer by the optical interferometry by limiting the surface roughness of a conductive substrate. The surface roughness of the conductive substrate provided in an electrophotographic photoreceptor is such that the maximum peak-to-valley roughness height (Ry)=0.8 to 1.4 μm, the centerline average roughness (Ra)=0.10 to 0.15 μm, the ten-point average roughness (Rz)=0.7 to 1.3 μm, the average peak-to-peak distance (Sm)=5 to 30 μm, and the peak count Pc=60 to 100. In such an electrophotographic photoreceptor, light for exposure can be scattered to an appropriate extent, so that interference fringes can be prevented, and an interference pattern is formed during measurement of the thickness of the photosensitive layer by the optical interferometry so that the thickness of the layer can be measured with a high precision.