The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2006

Filed:

Jun. 14, 2001
Applicants:

Michael R. Foster, Columbiaville, MI (US);

Robert X. LI, Grand Blanc, MI (US);

David E. Nelson, Waterford, MI (US);

Inventors:

Michael R. Foster, Columbiaville, MI (US);

Robert X. Li, Grand Blanc, MI (US);

David E. Nelson, Waterford, MI (US);

Assignee:

Delphi Technologies, Inc., Troy, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); F01N 3/01 (2006.01); F01N 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A non-thermal plasma reactor is provided. The non-thermal plasma reactor includes a plasma-generating substrate, a housing and a mat. The plasma-generating substrate has one or more flow paths for an exhaust gas. The housing has an inlet and an outlet. The mat retains the plasma-generating substrate in the housing such that the one or more flow paths are in fluid communication with the inlet and the outlet. A voltage is supplied to the plasma-generating substrate to generate a plasma field. An electrically insulating layer is disposed between the plasma-generating substrate and the housing for preventing an arc of electricity from the plasma-generating substrate and/or the voltage to the housing.


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