The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2006

Filed:

Apr. 04, 2003
Applicants:

Anand Chellappa, Albuquerque, NM (US);

Charles Call, Albuquerque, NM (US);

Michael Powell, Kennewick, WA (US);

Inventors:

Anand Chellappa, Albuquerque, NM (US);

Charles Call, Albuquerque, NM (US);

Michael Powell, Kennewick, WA (US);

Assignee:

Intelligent Engery, Inc., Long Beach, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); B01D 71/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for reducing the surface variance of a porous metal substrate. The method does not significantly reduce the bulk porosity. The method can be used to reduce the surface pore diameter. A membrane, can be deposited on the reduced variance surface to form a separation membrane.


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