The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Jan. 07, 2004
Hisaki Kurashina, Matsumoto, JP;
Hisaki Kurashina, Matsumoto, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A plurality of film formation layers on which respective film formation patterns are formed; interlayer films formed among the plurality of film formation layers; test element patterns formed in test element formation regions with the same material as that of each film formation pattern of at least one film formation layer among the plurality of film formation layers; openings formed in the test element formation regions of an interlayer film of a planarized uppermost layer, thereby exposing a pair of pads connected to the test element patterns; and dummy patterns formed below the corresponding one of the pair of pads with the same material as that of each of the film formation patterns of predetermined film formation layers among the plurality of film formation layers, thereby defining the vertical locations of the pads and the contact holes, etc. in the test element formation regions.