The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Oct. 24, 2005
Takashi Kubo, Kaisei-machi, JP;
Katsuaki Muraishi, Kaisei-machi, JP;
Toshihito Kimura, Kaisei-machi, JP;
Hitoshi Shimizu, Kaisei-machi, JP;
Nobufumi Mori, Kaisei-machi, JP;
Takashi Kubo, Kaisei-machi, JP;
Katsuaki Muraishi, Kaisei-machi, JP;
Toshihito Kimura, Kaisei-machi, JP;
Hitoshi Shimizu, Kaisei-machi, JP;
Nobufumi Mori, Kaisei-machi, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.