The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2006

Filed:

Nov. 15, 2004
Applicants:

Tiecheng A. Qiao, Webster, NY (US);

Yun C. Chang, Rochester, NY (US);

Eric R. Schmittou, Rochester, NY (US);

Thomas I. Penner, Fairport, NY (US);

Inventors:

Tiecheng A. Qiao, Webster, NY (US);

Yun C. Chang, Rochester, NY (US);

Eric R. Schmittou, Rochester, NY (US);

Thomas I. Penner, Fairport, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 33/543 (2006.01); G01N 33/532 (2006.01); G01N 33/53 (2006.01); C07C 39/04 (2006.01); C09D 189/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a method of particle separation comprising preparing a suspension of particles containing at least one recognizable target particle in a suspending solution, labeling the target particle with a conjugate marker, wherein the conjugate marker comprises at least one recognition unit for the recognizable target particle and at least one peroxidase enzyme, contacting a gelatin surface with the suspending solution, adding developer to the suspending solution in contact with the gelatin surface and in the presence of phenol to attach the target particle to the gelatin surface, and washing the gelatin surface to remove unattached particles. The method may also include detecting the presence of the target particle on the gelatin surface as well as detaching and recovering the attached particles after removal of the non-target particles.


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