The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Jun. 25, 2003
Nobuo Kurataka, Campbell, CA (US);
Christopher J. Formato, Brentwood, CA (US);
Hong Ying Wang, Fremont, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Christopher J. Formato, Brentwood, CA (US);
Hong Ying Wang, Fremont, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A method of manufacturing a stamper/imprinter for use in patterning of a recording medium comprising the sequential steps of providing a substrate/workpiece comprising a topographical pattern formed in a portion of a surface of the substrate/workpiece. The pattern defines a periphery. An alignment mark is formed in another portion of the surface of surrounding the periphery. An opaque protective film is formed overlying the entirety of the surface. A peripheral portion of the protective film is removed to expose the alignment mark. Selected portions of the substrate/workpiece are removed while the alignment mark is utilized for accurate alignment during the removal process. Remaining portions of the protective film are removed prior to use.