The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
May. 09, 2005
James J. Strohmeyer, Ballwin, MO (US);
William Blumfelder, Florissant, MO (US);
John Tehan, Chesterfield, MO (US);
Dennis Osterhorn, St. Louis, MO (US);
Joseph Matteoni, St. Charles, MO (US);
William J. Nelgner, St. Charles, MO (US);
Brian Lybarger, Granite City, IL (US);
David Schenken, St. Louis, MO (US);
James Wagy, Olivette, MO (US);
James J. Strohmeyer, Ballwin, MO (US);
William Blumfelder, Florissant, MO (US);
John Tehan, Chesterfield, MO (US);
Dennis Osterhorn, St. Louis, MO (US);
Joseph Matteoni, St. Charles, MO (US);
William J. Nelgner, St. Charles, MO (US);
Brian Lybarger, Granite City, IL (US);
David Schenken, St. Louis, MO (US);
James Wagy, Olivette, MO (US);
DRS Sustainment Systems, Inc., St. Louis, MO (US);
Abstract
Systems and methods for the detection of substances (particularly particulate substances) within mail pieces, specifically letters and other 'flats' of mail. In particular, the systems and methods are for the detection of residues of Chemical or Biological Warfare Agents (CBWAs) which may be present within the mail pieces. The system is principally designed to be included as part of Dual Pass Rough Cull System (DPRCS) for the collection and detection of the residue when the contaminated mail piece first enters a mail facility and before it is intermingled with other mail pieces.