The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Jul. 03, 2003
Hitoshi Sato, Mie, JP;
Sinya Mizone, Mie, JP;
Kiyoshi Ikeda, Mie, JP;
Hiroko Yamazaki, Mie, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A meshed etching tunnel made of aluminum is disposed inside a cylindrical quartz reactive chamber, and speaker diaphragms are aligned inside the tunnel at a certain interval. Opposing electrodes are disposed outside the reactive chamber. Plasma is applied at low temperature to prevent heat deformation. Uniform wettability is also assured by the use of the meshed etching tunnel, achieving high productivity. Uniform wettability further stabilizes bonding and improves bonding strength of the speaker diaphragm onto the voice coil and edge, offering a speaker with improved input power durability.