The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2006

Filed:

Aug. 12, 2005
Applicants:

Masafumi Mizuguchi, Yokohama, JP;

Norio Komine, Sagamihara, JP;

Inventors:

Masafumi Mizuguchi, Yokohama, JP;

Norio Komine, Sagamihara, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression:τ≧0.02 (ns·mJcm·pulse)wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm·pulse) per pulse, and τ is the pulse width (unit: ns).


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