The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
May. 28, 2002
Weijang Zhang, Grayslake, IL (US);
Margaret Chi-ping Hsu, Vernon Hills, IL (US);
Anthony R. Haight, Wadsworth, IL (US);
Matthew John Peterson, Gurnee, IL (US);
Bikshandarkoil A. Narayanan, Mundelein, IL (US);
Weijang Zhang, Grayslake, IL (US);
Margaret Chi-Ping Hsu, Vernon Hills, IL (US);
Anthony R. Haight, Wadsworth, IL (US);
Matthew John Peterson, Gurnee, IL (US);
Bikshandarkoil A. Narayanan, Mundelein, IL (US);
Abbott Laboratories, Abbott Park, IL (US);
Abstract
An efficient arylation technique for use in the synthesis of erythromycin derivatives, involving a modified Heck reaction which employs less than six mole percent of palladium catalyst and no phosphine is disclosed. With this modified Heck reaction, an O-alkenylaryl macrolide can be obtained in a much shorter reaction time than under conventional Heck reaction conditions. The modified Heck reaction can be utilized in a method for phosphine-free arylation of an O-allylic erythromycin derivative, in a method for preparing an O-alkenylaryl erythromycin A derivative, or in a method for preparing a 2', 4″-hydroxyl protected 6-O-alkenylaryl erythromycin A derivative.