The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
May. 14, 2001
Vladimir Markovich Kozenkov, Kowloon, HK;
Wing Chiu Yip, Kowloon, HK;
Vladimir Grigorievich Chigrinov, Kowloon, HK;
Elena Karlovna Prudnikova, Kowloon, HK;
Hoi Sing Kwok, Kowloon, HK;
Vladimir Markovich Kozenkov, Kowloon, HK;
Wing Chiu Yip, Kowloon, HK;
Vladimir Grigorievich Chigrinov, Kowloon, HK;
Elena Karlovna Prudnikova, Kowloon, HK;
Hoi Sing Kwok, Kowloon, HK;
The Hong Kong University of Science and Technology, Kowloon, HK;
Abstract
The present invention provides a method of forming a polarizing material comprising exposing a layer of dichroic material to activating light illumination to provide an ordered structure with a distinguished absorption axis and thus photo-induce polarization, and fixing the induced polarization by polymerisation of the dichroic layer. The present invention also provides novel polarizing materials formed thereby. By selectively exposing regions of the dichroic material to differing activating radiation, different regions with different polarization axes can be created. The polarizing material can also be provided with a coating or coatings to alter the spectral response, and a stack formed of a plurality if dichroic layers may be provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile