The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Mar. 29, 2001
Akira Shiokawa, Osaka, JP;
Hiroyosi Tanaka, Kyoto, JP;
Yoshiki Sasaki, Shijounawate, JP;
Masafumi Ookawa, Neyagawa, JP;
Junichi Hibino, Neyagawa, JP;
Akira Shiokawa, Osaka, JP;
Hiroyosi Tanaka, Kyoto, JP;
Yoshiki Sasaki, Shijounawate, JP;
Masafumi Ookawa, Neyagawa, JP;
Junichi Hibino, Neyagawa, JP;
Matsushita Electric Industrial Co. Ltd., Osaka-fu, JP;
Abstract
A manufacturing apparatus for a PDP includes a unit for forming a protective layer protecting a dielectric layer on a first plate, a unit for baking a phosphor layer applied on a second plate, a unit for sealing the first and second plates arranged so that the protective layer faces the phosphor layer, and a unit for baking the first and second plates while exhausting a space between them. The four units are placed in one or more closed chamber. When the apparatus is driven, spaces in and between the closed chambers each contain a gas atmosphere with vapor partial pressure of 10 mPa or lower, or with a pressure of 1 Pa or lower, where the protective layer and the phosphor layer exhibit less water-absorbing property, preventing degradation of the PDP performances. The protective layer does not contact with atmospheric carbonic acid gas, preventing alteration thereof.