The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Oct. 02, 2003
Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same
Shinichi Nakata, Izumi, JP;
Takayuki Ishino, Izumi, JP;
Masami Yamashita, Izumi, JP;
NEC LCD Technologies, Ltd., Kanagawa, JP;
Abstract
Light exposure areasand light masking areasin a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.