The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2006

Filed:

Feb. 14, 2003
Applicants:

Balekudru Devadas, Chesterfield, MO (US);

John Walker, Maryland Heights, MO (US);

Shaun R. Selness, Chesterfield, MO (US);

Terri L. Boehm, Ballwin, MO (US);

Richard C. Durley, Chesterfield, MO (US);

Rajesh Devraj, Chesterfield, MO (US);

Brian S. Hickory, Wildwood, MO (US);

Paul V. Rucker, University City, MO (US);

Kevin D. Jerome, Maryland Heights, MO (US);

Heather M. Madsen, University City, MO (US);

Edgardo Alvira, Chesterfield, MO (US);

Michele A. Promo, Maryland Heights, MO (US);

Radhika M. Blevis-bal, St. Louis, MO (US);

Laura D. Marruto, Ellisville, MO (US);

Jeff Hitchcock, Saint Peters, MO (US);

Thomas Owen, Chesterfield, MO (US);

Win Naing, Chesterfield, MO (US);

LI Xing, Chesterfield, MO (US);

Huey S. Shieh, St. Louis, MO (US);

Aruna Sambandam, Guilderland, NY (US);

Shuang Liu, Schenectady, NY (US);

Ian L. Scott, Woodinville, WA (US);

Kevin F. Mcgee, Guilderland, NY (US);

Inventors:

Balekudru Devadas, Chesterfield, MO (US);

John Walker, Maryland Heights, MO (US);

Shaun R. Selness, Chesterfield, MO (US);

Terri L. Boehm, Ballwin, MO (US);

Richard C. Durley, Chesterfield, MO (US);

Rajesh Devraj, Chesterfield, MO (US);

Brian S. Hickory, Wildwood, MO (US);

Paul V. Rucker, University City, MO (US);

Kevin D. Jerome, Maryland Heights, MO (US);

Heather M. Madsen, University City, MO (US);

Edgardo Alvira, Chesterfield, MO (US);

Michele A. Promo, Maryland Heights, MO (US);

Radhika M. Blevis-Bal, St. Louis, MO (US);

Laura D. Marruto, Ellisville, MO (US);

Jeff Hitchcock, Saint Peters, MO (US);

Thomas Owen, Chesterfield, MO (US);

Win Naing, Chesterfield, MO (US);

Li Xing, Chesterfield, MO (US);

Huey S. Shieh, St. Louis, MO (US);

Aruna Sambandam, Guilderland, NY (US);

Shuang Liu, Schenectady, NY (US);

Ian L. Scott, Woodinville, WA (US);

Kevin F. McGee, Guilderland, NY (US);

Assignee:

Pharmacia Corporation, St. Louis, MO (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 31/44 (2006.01); C07D 213/02 (2006.01); C07D 401/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are compounds Formula Iand pharmaceutically acceptable salts thereof, wherein R, R, R, R, and Rare defined herein. These compounds are useful for treating diseases and conditions caused or exacerbated by unregulated p38 MAP Kinase and/or TNF activity. Pharmaceutical compositions containing the compounds, methods of preparing the compounds and methods of treatment using the compounds are also disclosed.


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