The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2006

Filed:

May. 14, 2003
Applicants:

Faramarz Farahi, Charlotte, NC (US);

Patrick Moyer, Charlotte, NC (US);

Ramazan Benrashid, Charlotte, NC (US);

Pascal Dupriez, Charlotte, NC (US);

Inventors:

Faramarz Farahi, Charlotte, NC (US);

Patrick Moyer, Charlotte, NC (US);

Ramazan Benrashid, Charlotte, NC (US);

Pascal Dupriez, Charlotte, NC (US);

Assignee:

Waveguide Solutions, Inc., Charlotte, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The subject invention relates to the fabrication of micro-optical structures in a glass-like transparent material using conventional photolithography processing steps. The glass-like material is a spin-on glass (SOG) material, which behaves like a negative-tone photoresist, and has high quality optical properties similar to those of glass. The present invention can take advantage of gray scale photomasks to illuminate the uncured spin-on material with various illumination intensities, thus resulting in variations in resultant film thickness of the SOG material after the chemical development step. This results in micro-optical structures that can be fabricated with the desired shapes, depending on the transmission characteristics of each region of the gray scale photomask.


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