The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2006

Filed:

Aug. 16, 2003
Applicants:

Wen-jian Lin, Hsinchu, TW;

Hung-huei Hsu, Hsinchu, TW;

Hong-da Liu, Chu-Pei, TW;

Inventors:

Wen-Jian Lin, Hsinchu, TW;

Hung-Huei Hsu, Hsinchu, TW;

Hong-Da Liu, Chu-Pei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 7/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A structure of an ultra-micro reflector having abrasive surface with tapered micro bumps and free of resin layer and its fabrication method are provided. The reflector structure comprises mainly a layer of reflector metal, a scattering element with abrasive surface, and a layer of ITO. The abrasive surface has many tapered micro bumps. The reflector structure can be applied to a reflective or partially reflective LCD to achieve optimal performance. It makes the scattering angle of the reflective light source wider and more uniform. The variation of the gap of liquid crystal cells is greatly reduced, so that the reflective efficiency can be kept in an optimal condition. The reflector structure has larger scattering angle, smooth effect, and very good anti-glare effect. The fabrication process of the reflector structure is simple. The material cost for the abrasive surface is inexpensive. The reflector can endure higher temperature than conventional organic reflective elements, because the inorganic thin film process is used.


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