The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Dec. 03, 2003
Applicants:
Koichi Terunuma, Tokyo, JP;
Tetsuya Mino, Tokyo, JP;
Katsuya Kanakubo, Tokyo, JP;
Noriyuki Ito, Tokyo, JP;
Inventors:
Koichi Terunuma, Tokyo, JP;
Tetsuya Mino, Tokyo, JP;
Katsuya Kanakubo, Tokyo, JP;
Noriyuki Ito, Tokyo, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/193 (2006.01); B44C 1/22 (2006.01); C25D 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A first magnetic film is formed in a primary pattern which is larger than its definitive pattern and of which edges are located within frames to be used in a frame-plating method for the second magnetic film after forming the first pole portion and the gap film. Then, the second magnetic film is formed by the frame-plating method, and the first magnetic film is etched into the definitive pattern through the second magnetic film as a mask.