The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
May. 13, 2002
Karl Robert Erickson, Rochester, MN (US);
Douglas Allan Kuchta, Rochester, MN (US);
Douglas Howard Piltingsrud, Eyota, MN (US);
Karl Robert Erickson, Rochester, MN (US);
Douglas Allan Kuchta, Rochester, MN (US);
Douglas Howard Piltingsrud, Eyota, MN (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method for making a magnetic disk, without chemical mechanical polishing to remove asperities, includes the steps of placing an annular-shaped element in a vacuum chamber, exposing a surface of the element to a beam of gas clusters while it is in the vacuum chamber, and thereafter applying a magnetic coating. The annular-shaped element may be a substrate, or it may be a substrate with a base coating such as glassy carbon or amorphous carbon. The substrate may be made of glass, preferably high quality fusion glass. The surface of the annular element may be textured by forming a sequence of concentric annular valleys, with plateaus being left between the valleys, before the magnetic coating is applied. A semiconductor wafer may also be smoothed by a beam of gas clusters to prepare the wafer for photolithography.