The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Oct. 11, 2002
Krzysztof Matyjaszewski, Pittsburgh, PA (US);
Betül Kirci, Batikent Ankara, TR;
Jean François Lutz, Pittsburgh, PA (US);
Tomislav Pintauer, Pittsburgh, PA (US);
Krzysztof Matyjaszewski, Pittsburgh, PA (US);
Betül Kirci, Batikent Ankara, TR;
Jean François Lutz, Pittsburgh, PA (US);
Tomislav Pintauer, Pittsburgh, PA (US);
Carnegie Mellon University, Pittsburgh, PA (US);
Abstract
The present invention relates to a polymerization process for the control of the microstructure of polymers and to novel copolymers. An embodiment of the present invention relates a process of polymerizing first and second monomers in the presence of a complex comprising at least one of the monomers. The presence of the complex modifies the relative reactivity, or cross propagation rate constants, of the monomers in copolymerization reactions. Embodiments of the present invention allow the synthesis of polymers with novel stereochemistry and monomer sequence distribution, for example, but not limited to, copolymers with at least one segment of alternating monomers, a controlled molecular weight and narrow molecular weight distribution, or a segment of high concentration of the first monomer.